Thin Film Circuits

SemiGen offers build-to-print services for a wide range of materials and metallization schemes. We use our processing technology to fabricate circuits on As-Fired Alumina, Polished Alumina, Superstrate TPS, Aluminum Nitride, Beryllium Oxide, Fused Silica/Quartz, Sapphire, and Hi-K Dielectrics.

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SemiGen specializes in the manufacture of custom thin film circuits and other thin film products. Circuits can be manufactured to your drawing specifications, or we can work with your engineers to design a thin film circuit that meets your requirements.

 

Our fabrication facility uses a variety of equipment and manufacturing techniques to meet today's demanding design requirements. Processes include filled vias, plated through-holes, ion beam milling, sputtering, photolithography, electroplating, and dicing. Our ion beam etching process provides precise line definition and improved high-frequency performance compared with traditional chemical etching.

 

SemiGen’s expertise includes technology acquired through the acquisition of Ion Beam Milling in 2018 and its integration into our fabrication processes.

 

SemiGen Thin Film Circuit Substrate Materials, Resistor Films, and Metallization Options
Substrate Types Resistor Films and Metallization
Alumina Al2O3 Tantalum Nitride (TaN) Resistor Film 20–200 Ω/sq
Aluminum Nitride AlN Titanium Tungsten Gold TiW/Au
Fused Silica SiO2 Titanium Tungsten Nickel Gold TiW/Ni/Au
Beryllium Oxide BeO Titanium Platinum Gold Ti/Pt/Au
Diamond C Chromium Copper Gold Cr/Cu/Au

 

Our metallization capabilities include depositing the following materials:

  • Aluminum
  • Chrome
  • Chromium Copper Gold
  • Nickel
  • Gold
  • Palladium
  • Platinum
  • Titanium
  • Tungsten
  • Tantalum Nitride

 

Whether your requirement is for low-volume or production-volume manufacturing, SemiGen is ready to deliver. Our ion beam etching process produces accurate and repeatable thin film circuit features, along with other thin film products that meet our customers' quality requirements.

We process with the following substrate materials:

  • Alumina- As-Fired and Polished, 99.5% or greater
  • Aluminum Nitride
  • Quartz/Fuzed Silica
  • Sapphire
  • Ferrite/Garnet
  • Titanates (Hi-K materials)
  • Glass
Tech Brief Helps Make Critical Thin Film Manufacturing Decision
Resource

Tech Brief Helps Make Critical Thin Film Manufacturing Decision

Thin Film Circuit Design Guidelines Provide Keys to Successful Layout of Ion Beam Etched Circuits
Resource

Thin Film Circuit Design Guidelines Provide Keys to Successful Layout of Ion Beam Etched Circuits

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