Ion Beam Milling Service

Ion Beam Milling

SemiGen’s Ion Beam Milling Service is a dry etching technique in which the ions of an inert gas are accelerated from an ion source into the surface of the substrate in order to remove the metals. The advantage of Ion Beam Milling is that it is anisotropic, meaning the removal of the metals is highly specific in the vertical direction, resulting in minimum undercutting of the underlying metals during the etching process.

 

Ion beam etching technology provides a superior etching process over conventional chemical etching. With ion beam etching, there is no undercutting or cross-contamination, resulting in better overall RF circuit performance.

 

Ion Etching and Photolithography tools are used to manufacture a wide variety of unique products for biomedical, optical and magnetic applications. Some materials and applications:

 

Micro Machining

  • Silicon Wafers Si – IR Chopper Disc, Micro-Fluidics
  • Gallium Arsinide (GaAs)
  • Alumina Titanium Carbon Al2O3TiC Magnetic Heads for Disk Drives
  • Stainless Steel Molds Biomedical applications
  • Cylinder Etching Gyroscope application
  • Holographic Mirrors Optics and Laser

 

Etching depths, for products listed above, can range from a few thousand Angstroms to several microns.

 

Etch rates (Unit = Angstroms/Minute) posted here are estimates intended to provide insight on the etching of various materials.
Actual etch rates will vary depending on material stock used.

 

Etch rates (Unit = Angstroms/Minute) posted here are estimates intended to provide insight on the etching of various materials.
Actual etch rates will vary depending on material stock used.

 

Material Etch Rate (A/min)
Ag 1050
Al 373
Al 203 48
Au 630
AZ 1350 117
Be 76
Bi 5133
C 64
CdS 1283
Co 262
Cr 309
Cu 513
Fe 204
GaAs (100) 379
GaAs (110) 933
Gap (111) 927
GaPb (111) 1091
Ge 537
Hf 385
InSb 887
Ir 334
LiNb03 227
Mg 131
Mn 507
Mo 239
Mo27 163
Nb 274
Ni 309
Ni80Fe20 292
Material Etch Rate (A/min)
NiCr  309
Os  292
Pb  1517
PbTe  2199
Pd  642
Pt  362
PZT Ceramic  62
Rb 2333
Re 303
Rh 420
Riston 14 146
Ru 356
Sb 1889
Si 216
SiC 204
Si02 192
Sn 700
Soda Glass 117
Ta 245
Ta2O5 350
TaC 87
TaN 233
Ti 192
TiOrTiW 195
V 181
W 198
Y 554
Zr 332

 

SemiGen can process your etching requirements on customer supplied circuits and substrates..

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