Ion Beam Milling

SemiGen’s Ion Beam Milling Service is a dry etching technique in which the ions of an inert gas are accelerated from an ion source into the surface of the substrate in order to remove the metals. The advantage of Ion Beam Milling is that it is anisotropic, meaning the removal of the metals is highly specific in the vertical direction, resulting in minimum undercutting of the underlying metals during the etching process.

 

SemiGen can process your etching requirements on customer supplied circuits and substrates..

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