SemiGen


Download our Tech Brief:

This brief describes manufacturing thin film circuits using a next-generation anisotropic ion beam milling process that is proving to be the most precise, repeatable, and clean approach over the more random process of traditional material subtraction via chemical etching. 

“Leveraging the Precision of Ion Beam Milling Vs. Chemical Etching of Thin Film Circuits
get the brochure
ISO 9001:2008 Registered   ITAR Registered

54 Grenier Field Road Londonderry, NH 03053   |   603-624-8311   |   FAX 603-624-8312
All rights reserved. ©2010 - 2018 SemiGen, Inc.
Privacy Policy